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Ulf Helmersson now joins a distinguished group of scientists who have made a lasting mark on the discipline.

"Not many people have received this award, and everyone who has is someone I look up to. It is a great honor to be part of that group," he says.

At the same time, he emphasizes that the award reflects the work of many people, not just his own. Helmersson's research in plasma technology spans several decades and has involved numerous important collaborations.

"When I think about this award, I especially think about all the incredibly talented PhD students I have had the privilege to work with."

The award primarily recognizes Ulf Helmersson's long-standing contributions to thin-film technology and plasma physics. A key part of his research has focused on HiPIMS (High Power Impulse Magnetron Sputtering), an advanced plasma-based technique for producing thin functional coatings with a high degree of control over material properties. Today, the technology is used in areas such as the cutting-tool industry, and there is growing interest in applying it within the semiconductor sector.

"Sputtering can be described as playing the piano while wearing boxing gloves. With the HiPIMS method, it's like taking the gloves off. You still have to learn how to play the piano, though," says Ulf.

Over the past ten years, his research has also focused on nanostructured materials for catalysis, with applications in hydrogen production and the green transition. What continues to motivate him has remained unchanged since the start of his scientific career.

"It is the curiosity about what is really happening and the desire to create something new and useful that keeps me going. I have always been very focused on ensuring that my work can benefit society and industry," he says.

The award was presented at the Plasma Surface Engineering (PSE) 2026 conference in Erfurt, Germany. In addition to receiving the award, Ulf Helmersson delivered the award lecture titled High-power pulsed sputtering for the smart design of coatings and nanoparticles.